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Measuring Potential Modifications

PEYE can use the EYES system to estimate the impact of modifications on the chip layout. This make it possible to examine a range of possible modifications and modification strategies with significantly less resources and in a shorter time than can be achieved if the modifications where applied to the whole layout. Using the sampled results it is possible to identify which modifications should be applied to a particular chip design.

Targeted Modifications

A further use of the sampling results is to define regions of a chip where the a particular modification should be applied. Stated another way, the sampling data can identify regions where a modification need not be applied as there is little prospect of any modifications of that type being applied to that region.

The ability to automatically exclude regions is particularly useful where some large block of a design (e.g., RAM) is not suitable for the modification. It is also useful where a modification is split into sub types. For example, wire spreading is implemented as displacement of horizontal wire and displacement of vertical wire. Normally a metal layer runs in a preferred direction but occasionally a block or chip region might have been rotated and so the metal runs orthogonal to the preferred direction. Rather than run both the horizontal and vertical wire spreading routines over the whole design, sampled data can be used to indicated where horizontal and vertical wires (that can be modified) are likely to be.

The figure below shows such an example. Here metal3 normally runs in the horizontal direction but some regions of the chip contain vertical metal3, that sampling has shown can be modified. In order to minimise the work required, "masks" of the regions where modifications are to be implemented can be automatically generated and used to direct the modifications applied to each region.

Sampled Results for metal3 wire displacement/spreading and 'modification' masks
Sampled Results for metal3 wire displacement/spreading and 'modification' masks



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